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Low-Temperature Process for Atomic Layer Chemical Vapor Deposit…
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- 등록일 25-05-20
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Low-Temperature Process for Atomic Layer Chemical Vapor Deposition of an Al2 O3 Passivation Layer for Organic Photovoltaic Cells
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- Effects of Plasma Polymer Films and Their Deposition Powers on the Barrier Characteristics of the Multilayer Encapsulation for Organic Devices
 - Hydrocarbon Incorporation Effect on the Electrical Properties of Low Dielectric Constant SiCOH Films Deposited with Tetrakis(trimethylsilyloxy)silane and Cyclohexane Precursors
 
