PUBLICATION

홈 PUBLICATION PUBLICATION

PUBLICATION

Formation of Reliable HfO2/HfSixOy Gate-Dielectric for Metal-Oxide-S…

작성자최고관리자

  • 등록일 25-05-20
  • 조회20회
  • 이름최고관리자

본문

Formation of Reliable HfO2/HfSixOy Gate-Dielectric   for Metal-Oxide-Semiconductor Devices

첨부파일