Deposition of aluminum-doped zinc oxide films by RF magnetron sputteri…

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• Thickness Dependent Dielectric Property of BaTiO3/SrTiO3 Artificial Lattice
• Characteristics under Bias-Temperature-Stress of Cu/Low-ka-SiCO:H Structures Prepared by Plasma Enhanced Chemical Vapor Deposition Using a Hexamethyldisilane Precursor and Cu Sputtering